Conference paperDEEP UV PHOTOLITHOGRAPHY WITH COMPOSITE PHOTORESISTS MADE OF POLY(OLEFIN SULFONES).H. Hiraoka, L.W. Welsh Jr.ACS National Meeting 1983
Conference paperSIMULTANEOUS VAPOR DEPOSITION OF METAL AND MONOMERIC COMPOUNDS: LITHOGRAPHIC APPLICATIONS.H. Hiraoka, J. DuranMicrolithography 1986
PaperPolymer degradation in reactive ion etching and its possible application to all dry processesH. Hiraoka, L.W. Welsh Jr.Radiation Physics and Chemistry