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Conference paper
DEEP UV PHOTOLITHOGRAPHY WITH COMPOSITE PHOTORESISTS MADE OF POLY(OLEFIN SULFONES).
Abstract
Almost all poly(olefin sulfones) have been reported only as positive tone electron beam resists. As the only exception, poly(5-hexene-2-one sulfone) has been reported as a positive tone photoresist with or without a photosensitizer, benzophenone. Because this polymer has a carbonyl chromophore, its photosensitivity is clearly derived from the polymer structure itself. This paper reports first dry developable photoresists with poly(olefin sulfones) with photosensitizers like pyridine N-oxide, and then presents the study on composite resists made of poly(olefin sulfones) with novolac resins or with poly(p-hydroxystyrenes).