A 0.6 µm2 256Mb Trench DRAM Cell with Self-Aligned Buried Strap (BEST)
- L.A. Nesbit
- J. Alsmeier
- et al.
- 1993
- IEDM 1993
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Optimization of resolution-enhanced photolithography for a 256Mb DRAM cell
- R. Ferguson
- Christopher P. Ausschnitt
- et al.
- 1994
- VLSI Technology 1994