PaperOn the phenomenological model of preferred sputtering for SIMS and Auger profiling: A critical analysisN.J. Chou, M.W. ShaferSurface Science
PaperCharacterization of water vapor plasma‐modified polyimideR.D. Goldblatt, L. Ferreiro, et al.Journal of Applied Polymer Science
PaperMechanism of oxygen plasma etching of polydimethyl siloxane filmsN.J. Chou, C.H. Tang, et al.Applied Physics Letters
PaperAn internal calibration technique for pseudobinary systems by auger electron spectroscopyR. Hammer, N.J. Chou, et al.Journal of Electronic Materials
