About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
Journal of Applied Physics
Paper
Non-resistance-based cell-state metric for phase-change memory
Abstract
In phase-change memory (PCM), low-field electrical resistance is typically used to quantify the programmed cell state. However, this metric has several disadvantages. First, it exhibits temporal drift, which is a significant challenge for realizing multilevel PCM. Moreover, because of cell-geometry effects, this metric saturates after a certain point and thus masks the fact that the amorphous size increases with increasing input power. Finally, the resistance is typically measured as the current for a fixed bias voltage, which adversely affects the signal-to-noise ratio at high resistance values. A new metric for the programmed state in a PCM cell is proposed that has significant advantages over the resistance metric in all these aspects and is more representative of the fundamental programmed entity, which is the amorphous/crystalline phase configuration in the PCM cell. Analytical and experimental results are presented that demonstrate the efficacy of the proposed metric. © 2011 American Institute of Physics.