E. Occhiello, F. Garbassi, et al.
Journal of Physics D: Applied Physics
A simple phenomenological theory of alloy sputtering is developed which suggests that in some instances the depth resolution of depth profiling measurements is limited by the time it takes to create a layer of altered chemical composition at the surface.
E. Occhiello, F. Garbassi, et al.
Journal of Physics D: Applied Physics
J.W. Coburn
Thin Solid Films
J.W. Coburn, Harold F. Winters
Applied Physics Letters
Natasha C.Us, R.W. Sadowski, et al.
Plasma Chemistry and Plasma Processing