Conference paper
MOSFET performance scaling: Limitations and future options
Dimitri A. Antoniadis, Ali Khakifirooz
IEDM 2008
Fully depleted SOI (FDSOI) has become a viable technology not only for continued CMOS scaling to 22 nm node and beyond but also for improving the performances of legacy technology when retrofitting to old technology nodes. In this paper, we provide an overview of FDSOI technology, including the benefits and challenges in FDSOI design, manufacturing, and ecosystem. We articulate that FDSOI is potential cornerstone for China to catch up and leapfrog in semiconductor technology.
Dimitri A. Antoniadis, Ali Khakifirooz
IEDM 2008
Ali Khakifirooz, Osama M. Nayfeh, et al.
IEEE Transactions on Electron Devices
Ali Khakifirooz, Kangguo Cheng, et al.
ISSCC 2010
Pranita Kulkarni, Q. Liu, et al.
SISPAD 2011