Proceedings of SPIE 1989
Conference paper

Electron beam fabrication and characterization of fresnel zone plates for soft x-ray microscopy

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A high resolution Vector Scan electron beam lithography system for fabrication of structures with minimum dimensions below 100 nm is described. A selection was made from a variety of processes suitable for high resolution fabrication, in order to provide the desired properties of apodized Fresnel zone plates used in the Stony Brook X-ray scanning microscope. Experimental characterization of the zone plates with regard to resolution and efficiency in the microscope is described. © 1984 SPIE.