Electron beam fabrication and characterization of fresnel zone plates for soft x-ray microscopy

Abstract

A high resolution Vector Scan electron beam lithography system for fabrication of structures with minimum dimensions below 100 nm is described. A selection was made from a variety of processes suitable for high resolution fabrication, in order to provide the desired properties of apodized Fresnel zone plates used in the Stony Brook X-ray scanning microscope. Experimental characterization of the zone plates with regard to resolution and efficiency in the microscope is described. © 1984 SPIE.