About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
Applied Physics Letters
Paper
Electromigration-induced microstructure evolution in tin studied by synchrotron x-ray microdiffraction
Abstract
A grain-by-grain analysis of the microstructural evolution in Sn stripe under electromigration using synchrotron-based white beam x-ray microdiffraction was investigated. Grain-by-grain analysis was obtained from the diffracted Laue patterns about the changes of grain orientation before and after electromigration. It was observed that high-resistance grains reorient with respect to the neighboring low-resistance grains. A different mechanism of grain growth under electromigration from the normal grain growth was also proposed and discussed.