John G. Long, Peter C. Searson, et al.
JES
The dc electrical resistivity of LPCVD boro-hydro-nitride films was measured for various film deposition parameters, and was found to be directly related to the optical transparency as well as the mechanical stress of the x-ray mask membranes prepared from these films. The influence of the film's hydrogen and boron content on electrical resistivity is also being reported. Experimental results describe the effect of x-ray radiation on the film's chemical composition, Young's modulus and electrical resistivity. Radiation effects relevant to x-ray lithography, which are mechanical distortion and optical transparency of the mask membranes prepared from those films, are also described. Experimental evidence suggests that the radiation damage relevant to x-ray lithography in the mask membranes is directly related to their initial electrical resistivity (measured before irradiation). © 1987.
John G. Long, Peter C. Searson, et al.
JES
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Shiyi Chen, Daniel Martínez, et al.
Physics of Fluids
Andreas C. Cangellaris, Karen M. Coperich, et al.
EMC 2001