InAs/GaAs quantum well lasers grown by atomic layer epitaxy
M.A. Tischler, N.G. Anderson, et al.
Proceedings of SPIE 1989
The electrical characteristics of regrown interfaces deposited using an alternate metalorganic chemistry, diethylgallium chloride (DEGaCl), are investigated. With the appropriate HCl pre-regrowth surface treatment, these interfaces are found to be of very high quality with no substantial interface charge. The contact resistivity, as determined by transmission line measurements, is (2-4)×10-7 Ω cm2 at both 77 and 300 K. Secondary-ion mass spectroscopy measurements show no detectable accumulation of impurities at the regrown interface, in contrast to those regrown using the conventional trimethylgallium-based chemistry.
M.A. Tischler, N.G. Anderson, et al.
Proceedings of SPIE 1989
S.S. Lau, W.X. Chen, et al.
Applied Physics Letters
C.C. Han, X.Z. Wang, et al.
Journal of Applied Physics
M.A. Tischler, B.D. Parker
Applied Physics Letters