J.W. Coburn
Plasma Chemistry and Plasma Processing
Paper
Effect of ion bombardment on the plasma-assisted etching and deposition of plasma perfluoropolymer thin films
Abstract
A study of the etching and deposition of plasma perfluoropolymer thin films has been carried out by using quartz-crystal microbalance methods for a range of feed gas mixtures.
Related
J.W. Coburn, E. Taglauer, et al.
Japanese Journal of Applied Physics
J.W. Coburn
Review of Scientific Instruments
J.W. Coburn
JVSTA