K. Köhler, J.W. Coburn, et al.
Journal of Applied Physics
Paper
Effect of ion bombardment on the plasma-assisted etching and deposition of plasma perfluoropolymer thin films
Abstract
A study of the etching and deposition of plasma perfluoropolymer thin films has been carried out by using quartz-crystal microbalance methods for a range of feed gas mixtures.
Related
Conference paper
PLASMA POTENTIALS IN rf GLOW DISCHARGES.
J.W. Coburn, K. Koehler
Symposium on Plasma Processing 1986
Conference paper
Role of ions in reactive ion etching
J.W. Coburn
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
U. Gerlach-Meyer, J.W. Coburn, et al.
Surface Science