J.W. Coburn
Thin Solid Films
Paper
Effect of ion bombardment on the plasma-assisted etching and deposition of plasma perfluoropolymer thin films
Abstract
A study of the etching and deposition of plasma perfluoropolymer thin films has been carried out by using quartz-crystal microbalance methods for a range of feed gas mixtures.
Related
Conference paper
PLASMA POTENTIALS IN rf GLOW DISCHARGES.
J.W. Coburn, K. Koehler
Symposium on Plasma Processing 1986
J.W. Coburn, M. Chen
Journal of Applied Physics
J.W. Coburn
Review of Scientific Instruments