PLASMA POTENTIALS IN rf GLOW DISCHARGES.

Abstract

The factors which influence the plasma potential in rf glow discharges have been studied by energy analyzing the positive ions extracted through an orifice in the grounded anode plane of a planar plasma system. These studies have been carried out using He, Ne, Ar, Kr, Xe, CF//4, SF//6 and H//2 discharges in the pressure range 20 to 200 millitorr, for excitation frequencies from 70 kHZ to 13. 56 MHZ, and for several modes of applying the rf power to the excitation electrode.