Design and fabrication of microelectronic lenses

Abstract

Programs written to assist in the design and evaluation of microelectronic lenses are briefly described. Over the past 15 years, several families of lenses were designed using these programs. Basically, the higher order aberrations are mapped for a series of similar designs with corrected Seidel aberrations. The OTF program is used to guide the final stages of design. Two lens structures are described that a fully automatic program could not produce. The last section deals with the practical aspects of making lens elements, mechanical assembly, and testing completed objectives. © 1980 SPIE.