Commercialization of Non-PFAS KrF and Development of Non-PFAS EUV Photoresists

Aligned with our safe and sustainable by design culture, DuPont has initiated a comprehensive program focused on exploring non-PFAS/non-fluorinated alternatives in photoresist and lithographic patterning materials. A library of novel non-fluorine photoacid generators (PAG) have been developed and applied into KrF and EUV photoresists for various applications. This paper will summarize our efforts to investigate the relationship between the properties of non-fluorine PAGs and the lithographic performance parameters, such as Process Window (PW), Iso-focal Region (IFR), Iso-Dense Bias (IDB), and pattern profiles. This lithographic performance parameter data will help to provide the fundamental understanding needed for the development of commercially viable non-fluorine KrF photoresist alternatives.