The Impact of Polymer Compositional Homogeneity on Lithography and DefectsBenjamin D. Rafael-NaabJong Keun Parket al.2025SPIE Advanced Lithography 2025
New Photoacid Generators Designed for Advanced EUV PatterningKamal P. PandeyEmad Aqadet al.2025SPIE Advanced Lithography 2025
Commercialization of Non-PFAS KrF and Development of Non-PFAS EUV PhotoresistsCong LiuJoseph Lachowskiet al.2025SPIE Advanced Lithography 2025