Consideration on segregation behavior of the surface localization material and the pattern roughness degradation in EUV lithography
- KwangMo Choi
- YunJi Kim
- et al.
- 2025
- SPIE Advanced Lithography 2025
Publications
6 results at SPIE Advanced Lithography 2025
New Photoacid Generators Designed for Advanced EUV Patterning
- Kamal P. Pandey
- Emad Aqad
- et al.
- 2025
- SPIE Advanced Lithography 2025
New Molecular Resist Design for Advanced Patterning
- Vageesha Liyana Gunawardana
- Emad Aqad
- et al.
- 2025
- SPIE Advanced Lithography 2025
Commercialization of Non-PFAS KrF and Development of Non-PFAS EUV Photoresists
- Cong Liu
- Joseph Lachowski
- et al.
- 2025
- SPIE Advanced Lithography 2025
Effect of Composition Uniformity in the Polymer Chain of EUV Photoresist on Lithographic Performance
- EuiJin Ko
- YooRim Jang
- et al.
- 2025
- SPIE Advanced Lithography 2025
The Impact of Polymer Compositional Homogeneity on Lithography and Defects
- Benjamin D. Rafael-Naab
- Jong Keun Park
- et al.
- 2025
- SPIE Advanced Lithography 2025