About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
Physical Review B - CMMP
Paper
Burstein-Moss shift of n-doped In0.53Ga0.47As/inp
Abstract
We have evaluated the Burstein-Moss (BM) shift at 300 K in seven samples of n-In0.53Ga0.47As (1.3 x 1016≤n≤3.9x 1019 cm-3) lattice matched to InP using spectral ellipsometry in the range of 0.4-5.1 eV. The data have been fitted over the entire spectral range to a model reported by Holden et al. [in Thermphotovoltaic Generation of Electricity, edited by T. J. Coutts, J. P. Brenner, and C. S. Allman, AIP Conf. Proc. No. 460 (AIP, Woodbury, NY, 1999), p. 39], based on the electronic energy-band structure near critical points plus relevant discrete and continuum excitonic effects. A Fermi-level filling factor in the region of the fundamental gap has been used to account for the BM effect. While our data exhibit nonparabolic effects, with a blueshift of 415 meV for the most highly doped sample, we did not observe the Fermi-level saturation at 130 meV for n ≥ 1019 cm-3 reported by Tsukernik et al. [Proceedings of the 24th International Conference on the Physics of Semiconductors, Jerusalem, 1998, edited by D. Gershoni (World Scientific, Singapore, 1999)]. Our BM displacements are in agreement with a modified full-potential linearized augmented- plane-wave calculation [G. W. Charache et al., J. Appl. Phys. 86, 452 (1999)] plus possible band- gap-reduction effects.