Publication
IEEE T-ED
Paper

Automatic Positioning of Device Electrodes Using the Scanning Electron Microscope

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Abstract

In current technology, the edge definition that can be achieved by the photo resist process is approximately ten times sharper than the registration accuracy that can be maintained over a work piece of any reasonable size. A description is presented of an attempt to improve registration through feedback from the work piece itself; the servo signal is generated by the photo resisted posing radiation, a submicron-diameter electron beam. Using this technique, the gate electrode of a field-effect transistor (FET) has been automatically positioned relative to the channel. Copyright © 1965—THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, INC.

Date

01 Jan 1965

Publication

IEEE T-ED

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