Conference paperScalability of planar FDSOI and FinFETs and What's in store for the future beyond that?Bruce Doris, Terence B. HookESSDERC 2015
PaperThe combined effects of deuterium anneals and deuterated barrier-nitride processing on hot-electron degradation in MOSFET'sThomas G. Ference, Jay S. Burnham, et al.IEEE Transactions on Electron Devices
Conference paperComparison of heat outflow in dense sub-14nm contemporary NFETs: Bulk/SOI, inserted-oxide FinFET and nanowire FETIshita Jain, Anshul Gupta, et al.ICEE 2016
Conference paperRapid and Holistic Technology Evaluation for Exploratory DTCO in beyond 7nm TechnologiesMyung-Hee Na, Albert Chu, et al.SISPAD 2018