Publication
VLSI-TSA 2013
Conference paper

A perspective on future nanoelectronic devices

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Abstract

One clear direction for the development of future nanoelectronic devices is low power and high performance at low operating voltage. The fact that CMOS has a subthreshold region and a linear region, and that CMOS circuits operate at Vdd a few times Vt suggest that it is a challenge to reduce CMOS voltage towards 0.5 V. However, there is evidence that SOI lateral bipolar could be a low-power and high-performance technology. SOI lateral bipolar devices using small-gap semiconductors offer a clear path for high performance and low power bipolar circuits at about 0.5 V. © 2013 IEEE.

Date

12 Aug 2013

Publication

VLSI-TSA 2013

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