Challenges for silicon technology scaling in the nanoscale era
Tze-Chiang Chen
ESSCIRC 2009
The control of the lateral diffusion of the extrinsic base is a key issue in the downscaling of high-speed bipolar transistors for achieving the lowest base resistance without altering the shallow impurity profile of the intrinsic region. This letter will present the effects of lateral encroachment of the extrinsic-base dopant on the characteristics of transistors with submicrometer emitter stripe width, measurement of the amount of encroachment, and its relationship to the vertical profile. Copyright © 1987 by The Institute of Electrical and Electronics Engineers, Inc.
Tze-Chiang Chen
ESSCIRC 2009
Chunjian Ni, Rajiv V. Joshi, et al.
ASME Electronic and Photonics Packaging Division 2007
Keunwoo Kim, Ching-Te Chuang, et al.
International Journal of Electronics
Rajiv Joshi, Rouwaida Kanj, et al.
ISLPED 2007