About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
IEDM 1992
Conference paper
203 μa threshold current strained V-groove lasers
Abstract
Strained, self-aligned, and self-isolated V-groove lasers, operating near 980 nm with a minimum threshold current of 203 mu A, have been fabricated using molecular-beam epitaxy. The structures nominally employ Ga0.8In0.2As as the active gain medium. The lasing wavelength is a function of operating current and varies by a few nm. The far-field patterns are nearly circular. The characteristic temperature of the lasers is approximately=184 K and under application of external uniaxial stress from compressive to tensile conditions, the threshold current increases monotonically. Transmission electron microscopy reveals an increase in the well-width at the bottom of the grooves and a decrease along the walls. The low threshold current, lowest reported to date for a semiconductor laser, with or without the use of high reflectivity mirrors, and the other observations, are consistent with effects of single dimensionality due to confinement, effects of strain, and a reduction in parasitic recombination and leakage current. The optical power per facet is approximately 10 mu W and the 3-dB small-signal modulation frequency is below 10 GHz. The latter, lower than that of strained ridge laser structures, is believed to be dominated by capture and transmission-line effects.