Publications

This is our catalog of recent publications authored by IBM researchers, in collaboration with the global research community. We’re currently adding our back catalog of more than 110,000 publications. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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Year

7 results at SPIE Advanced Lithography 2022

Control of sidewall roughness formation in through-silicon via etch at non-cryogenic temperatures
- - John M. Papalia
  - Devi Koty
  - et al.
- 2022
- SPIE Advanced Lithography 2022
Vertical Travelling Scatterometry for Metrology on Fully Integrated Devices
- - D. Schmidt
  - M. Medikonda
  - et al.
- 2022
- SPIE Advanced Lithography 2022
Study of surface interactions for encapsulation of phase change memory materials
- - L. Buzi
  - D. Koty
  - et al.
- 2022
- SPIE Advanced Lithography 2022
Predicting overlay mark performance based on process emulation and optical simulation
- - Sagarika Mukesh
  - Jack Wong
  - et al.
- 2022
- SPIE Advanced Lithography 2022
Scatterometry based methodologies for characterization of MRAM technology
- - Manasa Medikonda
  - Daniel Schmidt
  - et al.
- 2022
- SPIE Advanced Lithography 2022
Throughput vs. Yield: reviewing the metrology needs for stochastics-aware process window analysis (SA-PWA)
- - Jennifer Church
  - Luciana Meli
- 2022
- SPIE Advanced Lithography 2022
Etch and Patterning Development for 2nm Node Nanosheet Devices
- - Eric Miller
  - Indira Seshadri
  - et al.
- 2022
- SPIE Advanced Lithography 2022