Experimental method for quantifying acid diffusion in chemically amplified resists
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
Date
Featured collections
Popular topics
10 results at SPIE Advances in Resist Technology and Processing 1999
Chemically amplified resists: Past, present, and future
- Hiroshi Ito
- 1999
- SPIE Advances in Resist Technology and Processing 1999
NMR analysis of chemically amplified resist films
- Hiroshi Ito
- M.H. Sherwood
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Molecular weight tailoring in methacrylate 193 nm photoresists
- Thomas I. Wallow
- P.J. Brock
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography
- Zhijian G. Lu
- Yuping Cui
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Aerial image contrast using interferometric lithography: Effect on line-edge roughness
- M.I. Sanchez
- W.D. Hinsberg
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Polymer platform dependent characteristics of 193 nm photoresists
- Juliann Opitz
- R.D. Allen
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
High resolution 248 nm bilayer resist
- Q. Lin
- K.E. Petrillo
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Approaches to etch resistant 193-nm photoresists: Performance and prospects
- R.D. Allen
- Juliann Opitz
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Development of an incremental structural parameter model for predicting reactive ion etch rates of 193 nm photoresist polymers
- Thomas I. Wallow
- P.J. Brock
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999