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Publication
SPIE Advances in Resist Technology and Processing 1999
Conference paper
Experimental method for quantifying acid diffusion in chemically amplified resists
Abstract
An experimental approach that allows decoupling of the chemical deprotection kinetics and acid transport kinetics is presented to provide a direct measure of acid diffusion properties. A well-defined, spatially non-uniform image of photogenerated acid is formed within a chemically amplified resist film using surface imaging method. Results from a static technique on surface imaged model systems are described. The application of 3-dimensional version of a stochastic chemical kinetics simulator to the analysis of data obtained from dynamic measurements on these systems is described.