Color halftone descreening based on color sigma filters
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- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
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Novel Si-based composite thin films for 193/157 nm attenuated phase shift mask(APSM) applications
- S. Jay Chey
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- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperUse of KRS-XE positive chemically amplified resist for optical mask manufacturing
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- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperA cost-benefit study of consumer product take back programs using IBM's WIT reverse logistics optimization tool
- Pitipong Veerakamolmal
- Yung-Joon Lee
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperFoveated wavelet image quality index
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- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Paper100 nm gate lithography for double gate transistors
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- Ying Zhang
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperAn algorithm for efficient segmentation and selection of representative frames in video sequences
- Konstantin Y. Kupeev
- Zohar Sivan
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperCAMEL: Concept Annotated iMagE Libraries
- Apostol (Paul) Natsev
- Atul Chadha
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperAlternating phase-shifting mask with reduced aberration sensitivity: Lithography considerations
- Alfred K. Wong
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- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperAdvanced lithography kits: Serifs and hammerhead
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- et al.
- 2000
- Proceedings of SPIE - The International Society for Optical Engineering
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