Publications

Model-Based Raman Simulations for Optimized Metrology in Nanosheet Transistor Devices
- - Stefan Schoeche
  - Aron Cepler
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paper
Mitigating X‑ray–Induced Damage in CD‑SAXS Metrology of EUV Resists
- - Philipp Wieser
  - Kevin Yager
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paper
IBM Lithography Roadmap: Need for Future Lithography Tools and Masks and Requirements for Resists to Avoid Stochastic Defects
- - Allen Gabor
  - Martin Burkhardt
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paper
In-line XPS metrology for area selective deposition processes on patterned structures
- - Manasa Medikonda
  - Linda Wangoh
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paper
Scaling Single Expose EUV Gate LER Through Source-Resist-Mask Co-optimization
- - Gopal Kenath
  - Martin Burkhardt
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paper
A Single-Chip Laser Diode Driver with Built-In Frequency-Sweep Linearization for FMCW LiDAR
- - W. Zhu
  - J. Jiang
  - et al.
- 2026
- ISSCC 2026
Conference paper
Proactive Power Management-Based Supply Regulation with Online Learning for Variation-Tolerant Workload-Aware Droop Mitigation in 28nm CMOS
- - X. Chen
  - A. Liss
  - et al.
- 2026
- ISSCC 2026
Conference paper
Piggybacked SC-on-CSCR: A Modular On-Chip Switched-Capacitor Converter for 12-to-60V Input 1.8-to-5V Output Achieving 5.67mW/mm² Power Density and 71.5% Peak Efficiency
- - Y. Yang
  - Xin Zhang
  - et al.
- 2026
- ISSCC 2026
Conference paper
Spyre: An inference-optimized scalable AI accelerator for enterprise workloads
- - Matt Cohen
  - Monodeep Kar
  - et al.
- 2026
- ISSCC 2026
Conference paper
A 16-channel low-power cryo-CMOS flux control pulse generator ASIC in 14nm FinFET technology
- - Kevin Tien
  - David Frank
  - et al.
- 2026
- ISSCC 2026
Conference paper