Design of a positive resist for projection lithography in the mid‐UV
- Grant Willson
- Robert Miller
- et al.
- 2004
- Polymer Engineering & Science
Paper
Publications
45 results at Polymer Engineering & Science
The preparation of oriented morphologies of the thermotropic aromatic copolyester of poly(ethylene terephthalate) and 80 mole percent p‐acetoxybenzoic acid
- Anagnostis E. Zachariades
- John A. Logan
- 2004
- Polymer Engineering & Science
PaperSuper strong polymers in planar directions
- Anagnostis E. Zachariades
- James Economy
- 2004
- Polymer Engineering & Science
PaperStress‐Cracking of high density polyethylene in detergents
- Koksal Tonyali
- Charles E. Rogers
- et al.
- 2004
- Polymer Engineering & Science
PaperA deformation induced order‐disorder transition in isotactic polypropylene
- Ravi F. Saraf
- Roger S. Porter
- 2004
- Polymer Engineering & Science
PaperX‐ray determination of encapsulation stresses on silicon wafers
- L.T. Nguyen
- I.C. Noyan
- 2004
- Polymer Engineering & Science
PaperPolysilanes: Photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 2004
- Polymer Engineering & Science
PaperStress development in supported polymer films during thermal cycling
- Ho-Ming Tong
- C.-K. Hu
- et al.
- 2004
- Polymer Engineering & Science
PaperA molded deep‐UV portable conformable masking system
- B.J. Lin
- V.W. Chao
- et al.
- 2004
- Polymer Engineering & Science
PaperSoluble polysilanes: An interesting new class of radiation sensitive materials
- R.D. Miller
- D. Hofer
- et al.
- 2004
- Polymer Engineering & Science
Paper