Summary Abstract: Developments in broad-beam ion source technology and applicationsH.R. KaufmanJ.J. Cuomo1983JVSTA
Chemical bonding and reactions at Ti/Si and Ti/oxygen/Si interfacesR. BlitzG.W. Rubloffet al.1983JVSTA
A He-diffraction investigation of the p(2×2) and c(2×2) phases of oxygen on Ni(100)K.H. Rieder1983Surface Science
Schottky barrier formation at Pd, Pt, and Ni/Si(111) interfacesR.J. PurtellG. Hollingeret al.1983JVSTA
Importance of chain reactions in the plasma deposition of hydrogenated amorphous siliconIvan Haller1983JVSTA
Chemical bonding and Schottky barrier formation at transition metal-silicon interfacesPaul S. Ho1983JVSTA