Separation of interface states and electron trapping for hot carrier degradation in ultra-scaled replacement metal gate n-FinFETMiaomiao WangZuoguang Liuet al.2015IRPS 2015
A case study of electromigration reliability: From design point to system operationsBaozhen LiPaul Mulleret al.2015IRPS 2015
A critical analysis of sampling-based reconstruction methodology for dielectric breakdown systems (BEOL/MOL/FEOL)Ernest Y. WuJames Stathiset al.2015IRPS 2015
Time-integrated photon emission as a function of temperature in 32 nm CMOSAndrea Bahgat ShehataAlan J. Wegeret al.2015IRPS 2015
Impact of 3D copper TSV integration on 32SOI FEOL and BEOL reliabilityMukta FarooqGiuseppe La Rosaet al.2015IRPS 2015