A novel ALD SiBCN low-k spacer for parasitic capacitance reduction in FinFETs
- 2015
- VLSI Technology 2015
Publications
This is our catalog of recent publications authored by IBM researchers, in collaboration with the global research community. We’re currently adding our back catalog of more than 110,000 publications. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
Confined Epitaxial Lateral Overgrowth (CELO): A novel concept for scalable integration of CMOS-compatible InGaAs-on-insulator MOSFETs on large-area Si substrates
- 2015
- VLSI Technology 2015
An InGaAs on Si platform for CMOS with 200 mm InGaAs-OI substrate, gate-first, replacement gate planar and FinFETs down to 120 nm contact pitch
- 2015
- VLSI Technology 2015
An 82%-efficient multiphase voltage-regulator 3D interposer with on-chip magnetic inductors
- 2015
- VLSI Technology 2015
High-mobility High-Ge-Content Si1-xGex-OI PMOS FinFETs with fins formed using 3D germanium condensation with Ge fraction up to x∼ 0.7, scaled EOT∼8.5Å and ∼10nm fin width
- 2015
- VLSI Technology 2015
Si nanowire CMOS fabricated with minimal deviation from RMG FinFET technology showing record performance
- 2015
- VLSI Technology 2015
Cost-Aware Cloud Metering with Scalable Service Management Infrastructure
- 2015
- CLOUD 2015
Industry Cloud: A Driver for Enterprise Transformation
- 2015
- CLOUD 2015
Dynamic Fine-Grained Resource Provisioning for Heterogeneous Applications in Virtualized Cloud Data Center
- 2015
- CLOUD 2015
Everything as a Service (XaaS) on the Cloud: Origins, Current and Future Trends
- 2015
- CLOUD 2015