Neural network learning using non-ideal resistive memory devices
- Youngseok Kim
- Tayfun Gokmen
- et al.
- 2022
- Frontiers in Nanotechnology
Publications
This is our catalog of recent publications authored by IBM researchers, in collaboration with the global research community. We’re currently adding our back catalog of more than 110,000 publications. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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Year
32 results for H. Miyazoe
Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films
- S. G. Walton
- D. R. Boris
- et al.
- 2021
- JVSTA
Utilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurations
- L. Buzi
- H. Miyazoe
- et al.
- 2020
- JVSTA
A study on OTS-PCM pillar cell for 3-d stackable memory
- W. Chien
- C. Yeh
- et al.
- 2018
- IEEE T-ED
Nitride etching with hydrofluorocarbons III: Comparison of C4H9F and CH3F for low-k′ nitride spacer etch processes
- H. Miyazoe
- Nathan Marchack
- et al.
- 2018
- JVSTB
Nitride etching with hydrofluorocarbons. II. Evaluation of C4H9F for tight pitch Si3N4 patterning applications
- Nathan Marchack
- H. Miyazoe
- et al.
- 2018
- JVSTB
Highly selective dry etching of polystyrene-poly(methyl methacrylate) block copolymer by gas pulsing carbon monoxide-based plasmas
- H. Miyazoe
- Ashish Jagtiani
- et al.
- 2017
- Journal of Physics D: Applied Physics
Electron beam generated plasmas: Characteristics and etching of silicon nitride
- S. G. Walton
- D. R. Boris
- et al.
- 2017
- Microelectronic Engineering
Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
- Ashish Jagtiani
- H. Miyazoe
- et al.
- 2016
- JVSTA
Application of cyclic fluorocarbon/argon discharges to device patterning
- Dominik Metzler
- Kishore Uppireddi
- et al.
- 2016
- JVSTA