Resistivity of copper interconnects beyond the 7 nm node
- Adam Pyzyna
- Robert L. Bruce
- et al.
- 2015
- VLSI Technology 2015
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44 results for Hiroyuki Miyazoe
Self-aligned line-space pattern customization with directed self-assembly graphoepitaxy at 24nm pitch
- Hsinyu Tsai
- Hiroyuki Miyazoe
- et al.
- 2015
- SPIE Advanced Lithography 2015
The PiezoElectronic switch: A path to low energy electronics
- Paul Solomon
- Brian A. Bryce
- et al.
- 2013
- E3S 2013
Advanced plasma etch for the 10nm node and beyond
- Eric Joseph
- Sebastian Engelmann
- et al.
- 2013
- SPIE Advanced Lithography 2013
Pattern transfer of directed self-assembly (DSA) patterns for CMOS device applications
- Hsin-Yu Tsai
- Hiroyuki Miyazoe
- et al.
- 2013
- SPIE Advanced Lithography 2013
Patterning of CMOS device structures for 40-80nm pitches and beyond
- Sebastian U. Engelmann
- R.M. Martin
- et al.
- 2012
- SPIE Advanced Lithography 2012
Systematic studies on reactive ion etch-induced deformations of organic underlayers
- Martin Glodde
- Sebastian Engelmann
- et al.
- 2011
- SPIE Advanced Lithography 2011
Plasma processing for advanced microelectronics beyond CMOS
- Nathan Marchack
- L. Buzi
- et al.
- 2021
- Journal of Applied Physics
Effects of ultraviolet and vacuum ultraviolet synchrotron radiation on organic underlayers to modulate line-edge roughness of fine-pitch poly-silicon patterns
- Hiroyuki Miyazoe
- Sebastian U. Engelmann
- et al.
- 2017
- JVSTA
Neural network learning using non-ideal resistive memory devices
- Youngseok Kim
- Tayfun Gokmen
- et al.
- 2022
- Frontiers in Nanotechnology