Nitride etching with hydrofluorocarbons III: Comparison of C4H9F and CH3F for low-k′ nitride spacer etch processes
- Hiroyuki Miyazoe
- Nathan Marchack
- et al.
- 2018
- JVSTB
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81 results for Eric Joseph
Nitride etching with hydrofluorocarbons. II. Evaluation of C4H9F for tight pitch Si3N4 patterning applications
- Nathan Marchack
- Hiroyuki Miyazoe
- et al.
- 2018
- JVSTB
Cyclic Cl2/H2 quasi-atomic layer etching approach for TiN and TaN patterning using organic masks
- Nathan Marchack
- J. M. Papalia
- et al.
- 2017
- JVSTA
Nitride etching with hydrofluorocarbons. I. Selective etching of nitride over silicon and oxide materials by gas discharge optimization and selective deposition of fluorocarbon polymer
- Sebastian U. Engelmann
- Robert L. Bruce
- et al.
- 2017
- JVSTB
Resistivity of copper interconnects at 28 nm pitch and copper cross-sectional area below 100 nm2
- Adam Pyzyna
- Hsinyu Tsai
- et al.
- 2017
- IITC 2017
Highly selective dry etching of polystyrene-poly(methyl methacrylate) block copolymer by gas pulsing carbon monoxide-based plasmas
- Hiroyuki Miyazoe
- Ashish Jagtiani
- et al.
- 2017
- Journal of Physics D: Applied Physics
Electron beam generated plasmas: Characteristics and etching of silicon nitride
- S. G. Walton
- D. R. Boris
- et al.
- 2017
- Microelectronic Engineering
Wafer-scale integration of sacrificial nanofluidic chips for detecting and manipulating single DNA molecules
- Chao Wang
- Sung Wook Nam
- et al.
- 2017
- Nature Communications
Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C4F8 and Ar/CHF3 plasma
- Dominik Metzler
- Chen Li
- et al.
- 2016
- Journal of Chemical Physics
Evaluation of ALE processes for patterning
- J. M. Papalia
- Nathan Marchack
- et al.
- 2016
- SPIE Advanced Lithography 2016