Ultra-thin oxide reliability for ULSI applications
- Ernest Y. Wu
- James H. Stathis
- et al.
- 2000
- Semiconductor Science and Technology
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Gate oxide breakdown under Current Limited Constant Voltage Stress
- B.P. Linder
- J.H. Stathis
- et al.
- 2000
- Digest of Technical Papers-Symposium on VLSI Technology