Publications

109 results for Sebastian Engelmann

SiGe HBTs in 90nm BiCMOS technology demonstrating 300GHz/420GHz f _T/f_MAX through reduced R_b and C_cb parasitics
- - Renata Camillo-Castillo
  - Q. Liu
  - et al.
- 2013
- BCTM 2013
High-performance Si_1-xGe_x channel on insulator trigate PFETs featuring an implant-free process and aggressively-scaled fin and gate dimensions
- - P. Hashemi
  - M. Kobayashi
  - et al.
- 2013
- VLSI Circuits 2013
High-performance Si_1-xGe_x channel on insulator trigate PFETs featuring an implant-free process and aggressively-scaled fin and gate dimensions
- - P. Hashemi
  - M. Kobayashi
  - et al.
- 2013
- VLSI Technology 2013
Investigation of plasma etch damage to porous oxycarbosilane ultra low-k dielectric
- - Robert Bruce
  - Sebastian Engelmann
  - et al.
- 2013
- Journal of Physics D: Applied Physics
Advanced plasma etch for the 10nm node and beyond
- - Eric Joseph
  - Sebastian Engelmann
  - et al.
- 2013
- SPIE Advanced Lithography 2013
Pattern transfer of directed self-assembly (DSA) patterns for CMOS device applications
- - Hsin-Yu Tsai
  - Hiroyuki Miyazoe
  - et al.
- 2013
- SPIE Advanced Lithography 2013
Pattern transfer of directed self-assembly patterns for CMOS device applications
- - Hsin-Yu Tsai
  - Hiroyuki Miyazoe
  - et al.
- 2013
- J. Micro/Nanolithogr. MEMS MOEMS
Ultra low contact resistivities for CMOS beyond 10-nm node
- - Zhen Zhang
  - Siyuranga Obasa Koswatta
  - et al.
- 2013
- IEEE Electron Device Letters
The effects of vacuum ultraviolet radiation on low-k dielectric films
- - H. Sinha
  - H. Ren
  - et al.
- 2012
- Journal of Applied Physics
The effects of plasma exposure on low-k dielectric materials
- - J.L. Shohet
  - H. Ren
  - et al.
- 2012
- SPIE Advanced Lithography 2012