Selective atomic layer etching of HfO2 over silicon by precursor and substrate-dependent selective deposition
- Kang Yi Lin
- Chen Li
- et al.
- 2020
- JVSTA
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108 results for Sebastian Engelmann
Advances in Interfacing Optical Fibers to Nanophotonic Waveguides Via Mechanically Compliant Polymer Waveguides
- Tymon Barwicz
- Swetha Kamlapurkar
- et al.
- 2020
- IEEE JSTQE
Control of surface oxide formation in plasma-enhanced quasiatomic layer etching of tantalum nitride
- Nathan Marchack
- Jon L. Innocent-Dolor
- et al.
- 2020
- JVSTA
Integrated Metamaterial Interfaces for Self-Aligned Fiber-to-Chip Coupling in Volume Manufacturing
- Tymon Barwicz
- Bo Peng
- et al.
- 2019
- IEEE JSTQE
Utilizing surface modification in plasma-enhanced cyclic etching of tantalum nitride to surpass lithographic limits
- Nathan Marchack
- Keith Hernandez
- et al.
- 2019
- Plasma Processes and Polymers
Automated, high-throughput photonic packaging
- Tymon Barwicz
- Ted W. Lichoulas
- et al.
- 2018
- Optical Fiber Technology
Achieving ultrahigh etching selectivity of SiO2 over Si3N4 and Si in atomic layer etching by exploiting chemistry of complex hydrofluorocarbon precursors
- Kang Yi Lin
- Chen Li
- et al.
- 2018
- JVSTA
Nitride etching with hydrofluorocarbons III: Comparison of C4H9F and CH3F for low-k′ nitride spacer etch processes
- Hiroyuki Miyazoe
- Nathan Marchack
- et al.
- 2018
- JVSTB
Nitride etching with hydrofluorocarbons. II. Evaluation of C4H9F for tight pitch Si3N4 patterning applications
- Nathan Marchack
- Hiroyuki Miyazoe
- et al.
- 2018
- JVSTB
Nitride etching with hydrofluorocarbons. I. Selective etching of nitride over silicon and oxide materials by gas discharge optimization and selective deposition of fluorocarbon polymer
- Sebastian U. Engelmann
- Robert L. Bruce
- et al.
- 2017
- JVSTB