Publications

86 results for Nelson Felix

EUV processing and characterization for BEOL
- - Nicole Saulnier
  - Yongan Xu
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Scatterometry-based defect detection for DSA in-line process control
- - Robin Chao
  - Chi Chun Liu
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Towards production ready processing with a state-of-the-art EUV cluster
- - Karen Petrillo
  - Nicole Saulnier
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Characterization and mitigation of overlay error on silicon wafers with nonuniform stress
- - T.A. Brunner
  - V. Menon
  - et al.
- 2014
- SPIE Advanced Lithography 2014
CD optimization methodology for extending optical lithography
- - C. Wong
  - G. Seevaratnam
  - et al.
- 2013
- SPIE Advanced Lithography 2013
Characterization of wafer geometry and overlay error on silicon wafers with nonuniform stress
- - Timothy A. Brunner
  - Vinayan C. Menon
  - et al.
- 2013
- Journal of Micro/Nanolithography, MEMS, and MOEMS
High order wafer alignment in manufacturing
- - Michael Pike
  - Nelson Felix
  - et al.
- 2012
- SPIE Advanced Lithography 2012
Advanced overlay control in volume manufacturing
- - Timothy Wiltshire
  - Christopher Ausschnitt
  - et al.
- 2011
- ASMC 2011
Overlay improvement roadmap: Strategies for scanner control and product disposition for 5-nm overlay
- - Nelson M. Felix
  - Allen H. Gabor
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Smaller, smarter, faster, and more accurate: The new overlay metrology
- - Nelson M. Felix
  - Allen H. Gabor
  - et al.
- 2010
- SPIE Advanced Lithography 2010