Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma
- R. Bruce
- T. Lin
- et al.
- 2010
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
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Dependence of polymer surface roughening rate on deposited energy density during plasma processing
- Sebastian Engelmann
- Robert L. Bruce
- et al.
- 2009
- Plasma Processes and Polymers
Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C4 F 8 - And CF4 -based discharges
- S. Engelmann
- R. Bruce
- et al.
- 2009
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics