High performance UTBB FDSOI devices featuring 20nm gate length for 14nm node and beyondQ. LiuM. Vinetet al.2013IEDM 2013
Selective GeOx-scavenging from interfacial layer on Si1-xGex channel for high mobility Si/Si1-xGex CMOS applicationChoonghyun LeeH. Kimet al.2016VLSI Technology 2016