Publications

This is our catalog of recent publications authored by IBM researchers, in collaboration with the global research community. We’re currently adding our back catalog of more than 110,000 publications. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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Year

8 results for Yiping Yao

Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance
- - Chris Robinson
  - Cody Murray
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Inorganic hardmask development for EUV patterning
- - Anuja De Silva
  - A. Dutta
  - et al.
- 2018
- SPIE Advanced Lithography 2018
Low hydrogen silicon carbon nitride cap for high performance sub-10 nm Cu-low k interconnect
- - Son Van Nguyen
  - Shobha Hosadugra
  - et al.
- 2017
- ECS Meeting 2017 - New Orleans
Development of TiO₂ containing hardmasks through PEALD deposition
- - Anuja De Silva
  - Indira Seshadri
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Inorganic hardmask development for extreme ultraviolet patterning
- - Anuja De Silva
  - A. Dutta
  - et al.
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS
Low hydrogen silicon carbon nitride cap for high performance sub-10 nm Cu-low k interconnect
- - Son Van Nguyen
  - Shobha Hosadugra
  - et al.
- 2017
- ECS J. Solid State Sci. Technol.
Development of TiO₂ containing hardmasks through plasma-enhanced atomic layer deposition
- - Anuja De Silva
  - Indira Seshadri
  - et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
Study of alternate hardmasks for extreme ultraviolet patterning
- - Anuja De Silva
  - Indira Seshadri
  - et al.
- 2016
- JVSTB