Precise control over molecular dimensions of block-copolymer domains using the interfacial energy of chemically nanopatterned substrates

Abstract

The process lattitude of epitaxial block-copolymer lithography was investigated using the interfacial energy of chemically nanopatterned substrates. Random copolymers were synthesized via nitroxide mediated living free-radical polymerization. The resulting domain structure of the films was imaged using scanning electron microscopy (SEM). The results show that interfacial interactions between the blocks of copolymer films and chemically patterned surface plays a dominant role in epitaxial self-assembly.