A Novel Graded Antireflective Coating with Built-in Hardmask Properties Enabling 65nm and Below CMOS Device Patterning
- K. Babich
- N. Fukiage
- et al.
- 2003
- IEDM 2003
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34 results for A. Mahorowala
Selective deposition of AlOx for Fully Aligned Via in nano Cu interconnects
- Son Van Nguyen
- Hosadurga Shobha
- et al.
- 2021
- IITC 2021
Improving the power-performance of multicore processors through optimization of lithography and thermal processing
- A. Gabor
- T.A. Brunner
- et al.
- 2007
- SPIE Advanced Lithography 2007
RTA-driven intra-die variations in stage delay, and parametric sensitivities for 65nm technology
- I. Ahsan
- N. Zamdmer
- et al.
- 2006
- VLSI Technology 2006
Mastering double exposure process window aware OPC by means of virtual targets
- Henning Haffner
- Zachary Baum
- et al.
- 2006
- SPIE Photomask Technology 2006
Silicon containing polymer in applications for 193 nm high NA lithography processes
- Scan Bums
- Dirk Pfeiffer
- et al.
- 2006
- SPIE Advanced Lithography 2006
BEOL interconnects for 45 nm node and beyond
- R.R. Yu
- J. Doyle
- et al.
- 2005
- VMIC 2005
Line edge roughness reduction by plasma curing photoresists
- Arpan P. Mahorowala
- Kuang-Jung Chen
- et al.
- 2005
- Microlithography 2005
Preliminary evaluation of line edge roughness metrology based on CD-SAXS
- Ronald L. Jones
- Tengjiao Hu
- et al.
- 2004
- SPIE Advanced Lithography 2004
Current Developments of a High Performance CA Resist for Mask Making Application
- Wu-Song Huang
- Wei He
- et al.
- 2003
- Photomask and Next-Generation Lithography Mask Technology 2003