Selective atomic layer etching of HfO2 over silicon by precursor and substrate-dependent selective deposition
- Kang Yi Lin
- Chen Li
- et al.
- 2020
- JVSTA
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25 results for Dominik Metzler
Simulation of photoresist defect transfer through subsequent patterning processes
- Dominik Metzler
- Mohamed Oulmane
- et al.
- 2020
- SPIE Advanced Lithography 2020
Exploration of pillar local CDU improvement options for AI applications
- Charlie Liu
- Hao Tang
- et al.
- 2020
- SPIE Advanced Lithography 2020
An evaluation of Fuchs-Sondheimer and Mayadas-Shatzkes models below 14nm node wide lines
- R. S. Smith
- E. T. Ryan
- et al.
- 2019
- AIP Advances
Achieving ultrahigh etching selectivity of SiO2 over Si3N4 and Si in atomic layer etching by exploiting chemistry of complex hydrofluorocarbon precursors
- Kang Yi Lin
- Chen Li
- et al.
- 2018
- JVSTA
Introduction of pre-etch deposition techniques in EUV patterning
- Xun Xiang
- Genevieve Beique
- et al.
- 2018
- SPIE Advanced Lithography 2018
Polymer brush as adhesion promoter for EUV patterning
- Jing Guo
- Anuja De Silva
- et al.
- 2018
- SPIE Advanced Lithography 2018
Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C4F8 and Ar/CHF3 plasma
- Dominik Metzler
- Chen Li
- et al.
- 2016
- Journal of Chemical Physics
He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching
- Dominik Metzler
- Florian Weilnboeck
- et al.
- 2016
- JVSTB
Application of cyclic fluorocarbon/argon discharges to device patterning
- Dominik Metzler
- Kishore Uppireddi
- et al.
- 2016
- JVSTA