Interaction of hydrogen plasma with extreme low-k SiCOH dielectrics
- A. Grill
- V.V. Patel
- 2004
- JES
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155 results for Alfred Grill
Structural characterization of porous low-k thin films prepared by different techniques using x-ray porosimetry
- Hae-Jeong Lee
- Christopher L. Soles
- et al.
- 2004
- Journal of Applied Physics
Structure of low dielectric constant to extreme low dielectric constant SiCOH films: Fourier transform infrared spectroscopy characterization
- Alfred Grill
- Deborah A. Neumayer
- 2003
- Journal of Applied Physics
Porosity in plasma enhanced chemical vapor deposited SiCoH dielectrics: A comparative study
- A. Grill
- V.V. Patel
- et al.
- 2003
- Journal of Applied Physics
Static frequency divider circuit using 0.15 μm gate length Si0.2Ge0.8/Si0.7Ge0.3 p-MODFETs
- D. Singh
- S.J. Koester
- et al.
- 2003
- Electronics Letters
Plasma enhanced chemical vapor deposited SiCOH dielectrics: From low-k to extreme low-k interconnect materials
- Alfred Grill
- 2003
- Journal of Applied Physics
High-quality crystalline layer transfer from a silicon-on-insulator substrate onto a sapphire substrate using wafer bonding
- D. Singh
- L.T. Shi
- et al.
- 2003
- Journal of Electronic Materials
Diamond-like carbon coatings as biocompatible materials - An overview
- A. Grill
- 2003
- Diamond and Related Materials
Effects of precursor additives on the stability of plasma enhanced chemical vapor deposited a-GeC(O):H films
- A. Grill
- S. Guilley
- et al.
- 2002
- Journal of Materials Research
The role of hydrogen on the friction mechanism of diamond-like carbon films
- C. Donnet
- J. Fontaine
- et al.
- 2001
- Tribology Letters