A fundamental study on dissolution behavior of high-resolution molecular glass photoresists
- Anuja De Silva
- Linda K. Sundberg
- et al.
- 2008
- Chemistry of Materials
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12 results for Christopher K. Ober
Control of self-assembly of lithographically patternable block copolymer films
- Joan K. Bosworth
- Marvin Y. Paik
- et al.
- 2008
- ACS Nano
Control of morphology orientation in lithographically patternable diblock copolymers
- Joan K. Bosworth
- Xavier Andre
- et al.
- 2007
- J. Photopolym. Sci. Tech.
Rod-Coil Block Copolymers: An Iterative Synthetic Approach via Living Free-Radical Procedures
- Padma Gopalan
- Xuefa Li
- et al.
- 2003
- J Polym Sci Part A
Synthesis of ROD-coil diblock copolymers via nitroxide functionalized mesogenic ROD segments
- Padma Gopalan
- Xuefa Li
- et al.
- 2002
- ACS National Meeting 2002
Application of blends and side chain Si-O copolymers as high etch resistant sub 100 nm E-beam resists
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Diffusion and distribution of photoacid generators in thin polymer films
- Qinghuang Lin
- Marie Angelopoulos
- et al.
- 2000
- Materials Research Society Symposium - Proceedings
Supercritical CO2 processing for submicron imaging of fluoropolymers
- Narayan Sundararajan
- Shu Yang
- et al.
- 1999
- Chemistry of Materials
Polymer platform dependent characteristics of 193 nm photoresists
- Juliann Opitz
- R.D. Allen
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Diffusion and distribution studies of photoacid generators: Ion beam analysis in lithography
- Narayan Sundararajan
- Christopher F. Keimel
- et al.
- 1999
- J. Photopolym. Sci. Tech.