Initial experience establishing a EUV baseline lithography process for manufacturability assessment
- O.R. Wood II
- D. Back
- et al.
- 2007
- SPIE Advanced Lithography 2007
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4 results for Kurt Kimmel
Progress towards developing high performance immersion compatible materials and processes
- Karen Petrillo
- Kaushal Patel
- et al.
- 2005
- Microlithography 2005
Novel Si-based composite thin films for 193/157 nm attenuated phase shift mask(APSM) applications
- S. Jay Chey
- C.R. Guarnieri
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
High-accuracy defect-free X-Ray mask technology
- Steven C. Nash
- Thomas B. Faure
- et al.
- 1994
- Japanese Journal of Applied Physics