1.5-V single work-function W/WN/n+-poly gate CMOS device design with 110-nm buried-channel PMOS for 90-nm vertical-cell DRAM
- Rajesh Rengarajan
- Boyong He
- et al.
- 2002
- IEEE Electron Device Letters
Publications
Date
Featured collections
Popular topics
3 results for Yujun Li
Body voltage and history effect sensitivity to key device parameters in 90nm PD-SOI
- S. Kawanaka
- M.B. Ketchen
- et al.
- 2004
- IEEE International SOI Conference 2004
Challenges and future directions for the scaling of dynamic random-access memory (DRAM)
- Jack A. Mandelman
- Robert H. Dennard
- et al.
- 2002
- IBM J. Res. Dev