Layout optimizations for double patterning lithography
- David Z. Pan
- Jae-Seok Yang
- et al.
- 2009
- ASICON 2009
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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3 results for Yongchan Ban
ELIAD: Efficient Lithography Aware Detailed routing algorithm with compact and macro post-OPC printability prediction
- Minsik Cho
- Kun Yuan
- et al.
- 2009
- IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
ELIAD: Efficient lithography aware detailed routing algorithm with compact and macro post-OPC printability prediction
- Minsik Cho
- Kun Yuan
- et al.
- 2009
- IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems