FULLY SEALED HALF-MICROMETER NMOS TECHNOLOGY USING DIRECT-WIRE E-BEAM LITHOGRAPHY.
- M.R. Wordeman
- A.M. Schweighart
- et al.
- 1983
- VLSI Technology 1983
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A Fully Scaled Submicrometer NMOS Technology Using Direct-Write E-Beam Lithography
- Matthew R. Wordeman
- April M. Schweighart
- et al.
- 1985
- IEEE T-ED