The formation of silicides from thin films of some rare-earth metals
- J.E.E. Baglin
- F.M. D'Heurle
- et al.
- 2008
- Applied Physics Letters
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24 results for C.S. Petersson
Refractory metal silicide formation induced by As+ implantation
- M.Y. Tsai
- C.S. Petersson
- et al.
- 2008
- Applied Physics Letters
Observations on the hexagonal form of MoSi2 and WSi2 films produced by ion implantation and on related snowplow effects
- F.M. d'Heurle
- C.S. Petersson
- et al.
- 2008
- Journal of Applied Physics
Oxidation of silicon-germanium alloys. I. An experimental study
- P.-E. Hellberg
- S.-L. Zhang
- et al.
- 1997
- Journal of Applied Physics
Oxidation of silicon-germanium alloys. II. A mathematical model
- P.-E. Hellberg
- S.-L. Zhang
- et al.
- 1997
- Journal of Applied Physics
On the formation of epitaxial CoSi2 from the reaction of Si with a Co/Ti bilayer
- S.-L. Zhang
- J. Cardenas
- et al.
- 1995
- Applied Physics Letters
Schottky barriers of scandium and scandium monosilicide on silicon
- F.M. d'Heurle
- M.O. Aboelfotoh
- et al.
- 1991
- Applied Surface Science
The reaction of scandium thin films with silicon: diffusion, nucleation, resistivities
- O. Thomas
- C.S. Petersson
- et al.
- 1991
- Applied Surface Science
Electrical characteristics of Ti-Si(100) interfaces
- M.O. Aboelfotoh
- L. Stolt
- et al.
- 1989
- Thin Solid Films
Ion-implantation-induced fluorine agglomeration in tungsten disilicide prepared by low-pressure chemical vapour deposition
- C.Sture Petersson
- Harry J. Whitlow
- et al.
- 1989
- Nuclear Inst. and Methods in Physics Research, B